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Deposition of (Ti,Cr)N Film on LY12 Aluminum Alloy Substrate Through Multi-Arc Ion Plating
Author(s): 
Pages: 286-289
Year: Issue:  4
Journal: TRANSACTIONS OF BEIJING INSTITUTE OF TECHNOLOGY

Keyword:  LY12铝合金多弧离子镀(TiCr)N膜层;
Abstract: 研究在铝合金表面多弧离子镀(Ti,Cr)N膜的工艺可行性.利用正交试验确定最佳工艺参数,讨论靶材成分、沉积时间、偏压、氮气压力和弧电流对膜层性能和质量的影响,并对该膜层的耐蚀性能和摩擦学性能进行了研究.结果表明,铝合金表面可以沉积(Ti,Cr)N膜.当靶材成分为w(Ti)=80%,w(Cr)=20%,沉积时间为30 min,偏压为200 V,氮气压力为3.0 Pa,弧电流为75 A时,可得到膜基结合力为44 N,膜厚为1.77 μm的(Ti,Cr)N膜.
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