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yong yu yuan tong zhuang ling jian nei biao mian deng li zi ti jin mei li zi zhu ru de pian zhuan dian chang fa
Author(s): 
Pages: 59-63
Year: Issue:  4
Journal: Materials Science and Technology

Keyword:  等离子体浸没离子注入内表面改性偏转电场;
Abstract: 等离子体浸没离子注入(PIII)为解决束线离子注入所难以解决的圆筒状零件内表面注入处理问题提供了新的可能途径,但在应用中却受到注入能量和注入剂量偏低的限制.本文针对这一问题提出了偏转电场法用以提高内表面注入的能量和注入剂量.实验结来表明,采用这一方法可以有效地改善圆筒状零件内表面注入的注入情况.注入峰值深度提高了25%~100%,注入剂量提高了73%~113%.注入脉冲宽度的延长有利于注入离子向筒内部深入,利于筒深处注入效果的改善.
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